ABSTRACT
The effect of ethylenediamine [ED] and acetic acid on the corrosion inhibition of copper in 0.1 M NaNO] was studied. The study involved electrochemical polarization methods, gravimetric measurements and scanning electron microscopy investigations [SEM]. Both of ED and concentrated solutions of acetic acid >/= 10[-3] M act as a promoter while diluted concentrations of acetic acid = 10[-3] M decreased the corrosion rate [Icorr] and improved the inhibition efficiency [I.E] up to 62%. On the other hand, addition of 10[-5] M ED to different concentrations of acetic acid improved the inhibition efficiency to reach 65% at 10[-2] M. Ethylenediaminetetra-acetic acid [EDTA] addition shows a higher I.E in the presence of 10[-2] M EDTA amounted to 96% owing to the effect of the chelating agent